Press Release: UNISERS Ships First Fully-Automated Fab Tool
Press Release: UNISERS Ships First Fully-Automated Fab Tool
An automated, in-line 300mm wafer review system providing molecular particle characterization (metallic, organic, silica, and others) to pinpoint contamination sources.
Surface Enhanced Raman Spectroscopy (SERS) from individual nanoparticles down to 50nm, enabling molecular classification of defects accelerating detection and troubleshooting capabilities on the production floor of high-volume manufacturing.
Enhanced optical images are classified by shape and appearance to identify various characteristic features that remain hidden in usual optical microscopy or even electron microscopy. Shape, appearance, agglomerations and surrounding residues allow classifications.
AI enabled combination of knowledge on particle size, chemical fingerprint, and physical characterization enables our customer to identify and eliminate contamination sources faster.
Our technology is capable of optical detection of nanoparticles down to 10 nm in size.
Molecular classification and images of defects are used to identify contamination sources.
AI algorithms combine defect size, molecular classification and defect images to accelerate detection and troubleshooting on the production floor of high-volume chip manufacturing.
Our customers can easily and confidently identify the source of contamination, resulting in significant yield improvements. Higher quality chip production ensures the chips in your devices work reliably, so you can stay connected and keep discovering without limit.