An automated, in-line 300mm wafer review system providing molecular particle characterization (metallic, organic, silica, and others) to pinpoint contamination sources
A purpose-built liquid-defectivity system delivering an absolute cleanliness score across liquids/suppliers, and provides chemical fingerprints to trace sources upstream before fab entry.
After coating in our dedicated vacuum coating process, the wafer is scanned in our dedicated optical microscope. All nanoparticles down to 10 nm size are detected independent of composition of the nanoparticle and independent of the material of the wafer.
Our solution helps semiconductor manufacturers to deliver a higher chip production yield.
Our software accurately determines the size of the individual nanoparticles from the optical enhanced signals of the coating, down to 10 nm.
The enhanced optical images show various characteristic features that remain hidden in usual optical microscopy or even electron microscopy. Shape, appearance, agglomerations and surrounding residues allow classifications.
SERS (Surface Enhanced Raman Scattering) spectra can be recorded from selected nanoparticles at high speed. These spectra provide information about the molecular structure of the contaminants and help to trace the source.
We are building a rapidly growing data library that will help our customers to identify the source of contamination more accurately and much faster.
We have developed an additional unique technology that allows the controlled deposition of contaminants from liquids onto a wafer (or any other flat surface) in a way that mimics process conditions. This new method works not only for ultrapure water (UPW), but also other process chemicals such as IPA, H2SO4, HCl, etc.
Our technology is capable of optical detection of any nanoparticles down to 10 nm in size.
Because of our enhanced optical methodology, you get results faster without losing quality or accuracy.
With our technology, you can gather molecular information from individual nanoparticles (Raman signal).
Our technology works on any substrate with any nanoparticles, and customers are able to determine the accurate size distribution from all individual nanoparticles.
Our customers can easily and confidently identify the source of contamination, which results in significant cost and time savings compared to existing contamination analyzing solutions.
This results in a higher chip production yield and more profits.
We have built several generations of prototypes of 300mm wafer compatible machines, which we are using in our laboratory in Zürich to perform tests for our customers.
Customers are sending us unpatterned wafers or liquid chemicals, which we then analyze.
Please reach out to us to discuss how our techniques can complement your sample analysis.
